Holographic masks for computational proximity lithography with EUV radiation

Deuter, Valerie (Corresponding author); Grochowicz, Maciej; Brose, Sascha; Biller, J.; Danylyuk, Serhiy; Taubner, Thomas; Grützmacher, Detlev; Juschkin, Larissa

Bellingham, Washington, USA : SPIE (2018)
Contribution to a book, Contribution to a conference proceedings

In: International Conference on Extreme Ultraviolet Lithography 2018 : 17-20 September 2018, Monterey, California, United States / Kurt G. Ronse, Eric Hendrickx, Patrick P. Naulleau, Paolo A. Gargini, Toshiro Itani (editors) ; sponsored by: SPIE

Institutions

• Department of Physics [130000]
• Chair of Experimental Physics I A and I. Institute of Physics [131110]
• Chair of Optical Systems Technologies [418910]