Holographic masks for computational proximity lithography with EUV radiation

Bellingham, Washington, USA / SPIE (2018) [Contribution to a book, Contribution to a conference proceedings]

International Conference on Extreme Ultraviolet Lithography 2018 : 17-20 September 2018, Monterey, California, United States / Kurt G. Ronse, Eric Hendrickx, Patrick P. Naulleau, Paolo A. Gargini, Toshiro Itani (editors) ; sponsored by: SPIE


Selected Authors

Deuter, Valerie
Grochowicz, Maciej
Brose, Sascha
Biller, J.
Danylyuk, Serhiy

Other Authors

Taubner, Thomas
Grützmacher, Detlev
Juschkin, Larissa