Growth of (Ba, Sr)TiO3 thin films in a multi-wafer MOCVD reactor
Ehrhart, Peter; Fitsilis, F.; Regnery, R.; Jia, C.; Waser, Rainer; Schienle, F.; Schumacher, M.; Dauelsberg, M.; Strzyzewske, P.; Jürgensen, H.
New York, NY [u.a.] : Materials Research Society (2001)
Contribution to a book, Contribution to a conference proceedings
In: Ferroelectric thin films IX : symposium held November 26 - 30, 2000, Boston, Massachusetts, U.S.A. / ed.: Paul C. McIntyre ...
Page(s)/Article-Nr.: CC9.4, 6 S.
Identifier
- RWTH PUBLICATIONS: RWTH-CONV-180732