Control of effective cooling rate upon magnetron sputter deposition of glassy Ge15Te85
Pries, Julian; Wei, Shuai; Hoff, Felix; Lucas, Pierre (Corresponding author); Wuttig, Matthias
Amsterdam [u.a.] : Elsevier Science (2019, 2020)
Journal Article
In: Scripta materialia
Volume: 178
Page(s)/Article-Nr.: 223-226
Identifier
- DOI: 10.1016/j.scriptamat.2019.11.024
- DOI: 10.18154/RWTH-2020-02455
- RWTH PUBLICATIONS: RWTH-2020-02455