Auslegung und Charakterisierung einer Nanostrukturierungsanlage für den extrem-ultravioletten Strahlungsbereich

Brose, Sascha Manuel; Taubner, Thomas Günter (Thesis advisor); Loosen, Peter (Thesis advisor); Juschkin, L. (Thesis advisor)

Aachen (2018, 2019) [Dissertation / PhD Thesis]

Page(s): 1 Online-Ressource (III, 239 Seiten) : Illustrationen, Diagramme

Abstract

In this thesis the development and investigation of nanopatterning processes and methods with extreme ultraviolet (EUV) radiation is described. The design, realization and characterization of a compact EUV nanostructuring tool constitutes the core of this work. The tool is designed for contact and interference lithography schemes and especially suitable for the patterning of dense periodic structures on the nanoscale over areas of several square millimeters. With the use of a discharge-produced-plasma EUV source, high-efficiency diffraction gratings that serve as transmission masks, and a state-of-the-art positioning system, a resolution of 28 nm is demonstrated. Main parts of the thesis besides the engineering and construction of the tool are the characterization of the EUV source and the design of a corresponding monitoring system, the development of suitable transmission masks and the characterization of photoresists. Based on these pre-investigations the process window and the practical resolution limit of the exposure tool are determined.

Identifier

  • REPORT NUMBER: RWTH-2019-02641

Downloads