Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides

Severin, Daniel; Kappertz, Oliver; Kubart, Thomas; Nyberg, Tomas; Berg, S.; Pflug, Andreas; Siemers, M.; Wuttig, Matthias

Melville, N.Y : American Institute of Physics (2006)
Journal Article

In: Applied physics letters
Volume: 88
Issue: 16
Page(s)/Article-Nr.: 161504


  • Chair of Experimental Physics I A and I. Institute of Physics [131110]
  • Department of Physics [130000]