Publications

 

Here is a list of publications of our sputter deposition group:

  • M. Warzecha, D. Köhl, M. Wuttig, J. Hüpkes
    Ion beam assisted sputter deposition of ZnO for silicon thin-film solar cells
    Journal of physics / D, Applied physics (2014)
    link to Article
  • T. Leichtweiss, R. A. Henning, J. Koettgen, R. M. Schmidt, B. Holländer, et al.
    Amorphous and highly nonstoichiometric titania (TiOx) thin films close to metal-like conductivity
    Journal of materials chemistry / A, Materials for energy and sustainability (2014)
    link to Article
  • R.M. Schmidt, P. Ries, A. Pflug, M. Wuttig, T. Kubart
    Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering
    Surface & Coatings Technology 252, 74 (2014)
    link to Article
  • W. Dewald, V. Sittinger, B. Szyszka, F. Säuberlich, B. Stannowski, et al.
    Advanced properties of Al-doped ZnO films with a seed layer approach for industrial thin film photovoltaic application
    Thin solid films (2013)
    link to Article
  • D. Köhl, G. Natarajan, M. Wuttig
    Structure control of sputtered zinc oxide films by utilizing zinc oxide seed layers tailored by ion beam assisted sputtering
    Journal of physics / D, Applied physics (2012)
    link to Article
  • T. Kubart, R. M. Schmidt, M. Austgen, T. Nyberg, A. Pflug, et al.
    Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
    Surface & coatings technology (2012)
    link to Article
  • M. Austgen, D. Köhl, P. E. Zalden, T. Kubart, T. Nyberg, et al.
    Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties
    Journal of physics / D, Applied physics (2011)
    link to Article
  • T. Kubart, T. Nyberg, A. Pflug, M. Siemers, M. Austgen, et al.
    Modelling of sputtering yield amplification effect in reactive deposition of oxides
    Surface & coatings technology (2010)
    link to Article
  • A. Amin, D. Köhl, M. Wuttig
    The role of energetic ion bombardment during growth of TiO2 thin films
    by reactive sputtering
    J. of Physics D: Appl. Physics, 43, 405303 (2010)

    link to Article
  • J. Okumu, D. Köhl, A. Sprafke, G. von Plessen, M. Wuttig
    Formation mechanism of noble metal nanoparticles in reactively sputtered TiO2 films

    J. of Appl. Physics, 108, 063529 (2010)
    link to Article
  • T. Kubart, T. Nyberg, A. Pflug, M. Siemers, M. Austgen, D. Köhl, M. Wuttig, S. Berg
    Modelling of sputtering yield amplification effect in reactive deposition of oxides

    Surfaces & Coatings Technology, 3882 (2010)
    link to Article
  • D. Köhl, M. Luysberg, M. Wuttig
    Structural improvement of zinc oxide films produced by ion beam assisted reactive sputtering

    J. Phys. D: Appl. Phys. 43, 205301 (2010)
    link to Article
  • D. Köhl, M. Luysberg, M. Wuttig
    Highly textured zinc oxide films by room temperature ion beam assisted deposition
    Phys. Status Solidi RRL 3, 236 (2009)

    link to Article
  • D. Severin, O. Kappertz, T. Nyberg, S. Berg, A. Pflug, M. Wuttig
    Increase of the deposition rate in reactive sputtering of metal oxides using a ceramic nitride target
    J. Applied Physics 105, 093302 (2009)

    link to Article
  • J. Alami, K. Sarakinos, F. Uslu, C. Klever, J. Dukwen, M. Wuttig
    On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering
    J. of Physics D: Applied Physics 42, 115204 (2009)

    link to Article
  • J. Alami, K. Sarakinos, F. Uslu, M. Wuttig
    On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
    J. of Physics D: Applied Physics 42, 015304 (2009)

    link to Article
  • K. Sarakinos, J. Alami, C. Klever, M. Wuttig:
    Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide

    Surface Coatings and Technology 202, 5033 (2008)
    link to Article
  • D. Severin, K. Sarakinos, O. Kappertz, A. Pflug, and M. Wuttig :
    Tailoring of structure formation and phase composition in reactively sputtered zirconium oxide films using nitrogen as an additional reactive gas
    J. Appl. Phys. 103, 083306(2008)

    link to Article
  • K. Sarakinos, J. Alami, P.M. Karimi, D. Severin, M. Wuttig:
    The role of backscattered energetic atoms in film growth in reactive magnetron sputtering of chromium nitride
    J. Appl. Phys. 40, 778 (2007)
    link to Article

  • K. Sarakinos, J. Alami, C. Klever, M. Wuttig:
    Growth of TiOx films by high power pulsed magnetron sputtering from a compound TiO1.8 target
    Rev. Adv. Mater. Sci. 15, 44 (2007)
  • K. Sarakinos, J. Alami, M. Wuttig:
    "Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering"
    J. Phys. D: Appl. Phys., Vol. 40, p. 2108 (2007)

    link to Article
  • D. Severin, O. Kappertz, T. Nyberg, S. Berg, M. Wuttig:
    "The effect of target aging on the structure formation of zinc oxide during reactive sputtering"
    Thin Solid Films, Vol. 515, p. 3554 (2007)
    link to Article
  • S. Venkataraj, D. Severin, S.H. Mohamed, J. Ngaruiya, O. Kappertz, M. Wuttig:
    "Towards understanding the superior properties of transition metal oxynitrides prepared by reactive DC magnetron sputtering"
    Thin Solid Films, Vol. 502 , p. 228 (2006)
    link to Article

  • S. Venkataraj, D. Severin, R. Drese, F. Koerfer, M. Wuttig:
    "Structural, optical and mechanical properties of aluminium nitride films prepared by reactive DC magnetron sputtering"
    Thin Solid Films, Vol. 502 , p. 235 (2006)
    link to Article

  • D. Severin, O. Kappertz, T. Kubart, t. Nyberg, S. Berg, A. Pflug, M. Simers, M. Wuttig:
    "Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides"
    Applied Physics Letters, Vol. 88 , p. 161504 (2006)
    link to Article

  • J. Hüpkes, B. Rech, S. Calnan, O. Kluth, U. Zastrow, H. Siekmann, M. Wuttig:
    "Material study on reactively sputtered zinc oxide for thin-film silicon solar cells"
    Thin Solid Films, Vol. 502 , p. 286 (2006)
    link to Article

  • R. Drese, M. Wuttig:
    "In situ stress measurements in zirconium and zirconium oxide films prepared by direct-current sputtering"
    J. Applied Physics, Vol. 99 , p. 123517 (2006)
    link to Article

  • S. Venkataraj, H. Kittur, R. Drese, M. Wuttig:
    "Multi-technique characterization of tantalum oxinitride films prepared by reactive DC magnetron sputtering"
    Thin Solid Films, Vol. 514 , p. 1 (2006)
    link to Article

  • J. Alami, K. Sarakinos, G. Mark, M. Wuttig:
    "On the deposition rate in a high power pulsed magnetron sputtering discharge"
    applied Physics Letters, Vol. 89 , p. 154104 (2006)
    link to Article

  • J. Hüpkes, B. Rech, O. Kluth, T. Repmann, B. Zwaygardt, J. Müller, R. Drese, M. Wuttig:
    "Surface-textured MR-sputtered ZnO films for microcrystalline silicon-based thin-film solar cells"
    Solar Energy Materials and Solar Cells, Vol. 90 , p. 3054 (2006)
    link to Article

  • C. Salinga, O. Kappertz, M. Wuttig:
    "Reactive direct current magnetron sputtering of tungsten oxide : a correlation between film properties and deposition pressure"
    Thin Solid Films, Vol. 515 , p. 2760 (2006)
    link to Article

  • C. Salinga, O. Kappertz, M. Wuttig:
    "Gasochromic switching of reactively sputtered molybdenum films: A correlation between film properties and deposition pressure"
    Thin Solid Films, Vol. 515 , p. 1327 (2006)
    link to Article

  • J. Okumu, F. Körfer, C. Salinga, T.P. Pedersen, M. Wuttig:
    "Gasochromic switching of reactively sputtered molybdenumoxide films : a correlation between film properties and deposition pressure "
    Thin Solid Films, Vol. 515 , p. 1327 (2006)
    link to Article

  • J. Okumu, C. Dahmen, A.N. Sprafke, M. Luysberg, G. von Plessen, M. Wuttig:
    "Photochromic silver nanoparticles fabricated by sputter deposition"
    J. Applied Physics, Vol. 97 , p. 94305 (2005)
    link to Article

  • O. Kappertz, R. Drese, M. Wuttig:
    "Reactive sputter deposition of zinc oxide: Employing resputtering effects"
    Thin Solid Films, Vol. 484 , p. 64 (2005)
    link to Article

  • R. Drese, M. Wuttig:
    "Stress evolution during growth in direct-current sputtered zinc oxide films at various flows"
    J. Appl. Physics, Vol. 98 , p. 73514 (2005)
    link to Article

  • S. H. Mohamed, O. Kappertz, J. Ngaruiya, T. Niemeier, R. Drese, R. Detemple, M. Wakkad, M. Wuttig:
    "Influence of nitrogen content of direct current sputtered TiOxNy films"
    Physica Status Solidi, Vol. (a) 201 , p. 90 (2004)
    link to Article

  • J. M. Ngaruiya, O. Kappertz, C. Liesch, P. Müller, R. Dronskowski, M. Wuttig:
    "Composition and formation mechanism of zirconium oxynitride films produced by reactive magnetron sputtering"
    Physica Status Solidi, Vol. (a) 201 , p. 967 (2004)
    link to Article

  • C. Agashe, O. Kluth, J. Hüpkes, U. Zastrow, B. Rech, M. Wuttig:
    "Efforts to improve carrier mobility in RF sputtered ZnO:Al films"
    J. Applied Physics, Vol. 95 , p. 1911 (2004)
    link to Article

  • J. Okumu, F. Koerfer, C. Salinga, M. Wuttig:
    "In-situ measurements of thickness changes and mechanical stress upon gasochromic switching of thin MoOx films"
    J. Applied Physics, Vol. 95 , p. 7632 (2004)
    link to Article

  • S. Venkataraj, O. Kappertz, Ch. Liesch, R. Detemple, R. Jayavel, M. Wuttig:
    "Thermal stability of sputtered zirconium oxide films "
    Vacuum, Vol. 75 , p. 7 (2004)
    link to Article

  • J. M. Ngaruiya, O. Kappertz, S.H. Mohamed, M. Wuttig:
    "Structure formation upon reactive DC sputtering of transition metal oxides"
    Applied Physics Letters, Vol. 85 , p. 748 (2004)
    link to Article

  • T.L. Pedersen, C. Liesch, C. Salinga, T. Eleftheriades, M. Wuttig:
    "Hydrogen induced changes of mechanical stress and optical transmission in thin Pd films"
    Thin Solid Films, Vol. 458 , p. 299 (2004)
    link to Article

  • S. H. Mohamed, O. Kappertz, T. Niemeier, R. Drese, M. Wakkad, M. Wuttig:
    "Effect of heat treatment on structural, optical and mechanical properties of sputtered TiOxNy films"
    Thin Solid Films, Vol. 468 , p. 48 (2004)
    link to Article

  • W. Kalb, P. Lang, M. Mottaghi, H. Aubin, G. Horrowitz, M. Wuttig:
    "Structure-performance relationship in pentacene/Al2O3 thin-film transistors"
    Synthetic Metals, Vol. 146 , p. 279 (2004)
    link to Article

  • S. H. Mohamed, O. Kappertz, J. M. Ngaruiya, T.P. Pedersen, R. Drese, M. Wuttig:
    "Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films"
    Thin Solid Films, Vol. 429 , p. 135 (2003)
    link to Article

  • J. M. Ngaruiya, S. Venkataraj, R. Drese, O. Kappertz, T.P. Pedersen, M. Wuttig:
    "Preparation and characterization of tantalum oxide films produced by reactive DC magnetron sputtering"
    Physica Status Solidi, Vol. 198 , p. 99 (2003)
    link to Article

  • T.P. Pedersen, C. Salinga, H. Weis, M. Wuttig:
    "Mechanical stresses upon hydrogen induced optical switching of thin films"
    Journal of Applied Physics, Vol. 93 , p. 6034 (2003)
    link to Article

  • S. H. Mohamed, O. Kappertz, T.P. Pedersen, R. Drese, M. Wuttig:
    "Properties of TiOx coatings prepared by dc magnetron sputtering"
    Physica Status Solidi, Vol. 193 , p. 224 (2003)

  • S. Venkataraj, R. Drese, Ch. Liesch, O. Kappertz, R. Jayavel, M. Wuttig:
    "Temperature stability of sputtered niobium oxide films"
    J. Appl. Physics, Vol. 91 , p. 4863 (2002)
    link to Article

  • C. Salinga, H. Weis M. Wuttig:
    "Gasochromic switching of Tungsten Oxide Films: a correlation between film properties and coloration kinetics"
    Thin Solid Films, Vol. 414 , p. 288 (2002)
    link to Article

  • O. Kappertz, R. Drese, M. Wuttig:
    "Correlation between structure, stress and depositions parameters in DC-sputtered zinc oxide films"
    J. Vac. Sci. Technol. A, Vol. 20 , p. 2084 (2002)
    link to Article

  • S. Venkataraj, R. Drese, Ch.Liesch, O. Kappertz, R. Jayavel, M. Wuttig:
    "Thermal stability of lead oxide films prepared by reactive DC magnetron sputtering"
    Physica status solidi (a), Vol. 194 , p. 192 (2002)
    link to Article

  • S. Venkataraj, O. Kappertz, R. Jayavel, M. Wuttig:
    "Growth and characterization of zirconium oxinitride films prepared by reactive direct current magnetron sputtering"
    J. Appl. Physics, Vol. 92 , p. 2461 (2002)
    link to Article

  • S. Venkataraj, O. Kappertz, Hj. Weis, R. Drese, R. Jayavel, M. Wuttig:
    "Structural and optical properties of thin zirconium oxynitride films prepared by reactive direct current magnetron sputtering"
    J. Appl. Physics, Vol. 92 , p. 3599 (2002)
    link to Article

  • D. Kurapov, D. Neuschütz, R. Cremer, T. Pedersen, M. Wuttig, D. Dietrich, G. Marx, J.M. Schneider:
    "Synthesis and mechanical properties of BCN coatings deposited by PECVD"
    Vacuum, Vol. 68 , p. 335 (2002)
    link to Article

  • H.-W. Wöltgens, I. Friedrich, W. Njoroge, W. Theiss und M. Wuttig:
    "Optical, electrical and structural properties of Al-Ti and Al-Cr thin films"
    Thin Solid Films, Vol. 388 , p. 237 (2001)
    link to Article

  • S. Venkataraj, H. Weis, O. Kappertz, W. Njoroge, R. Jayavel, M. Wuttig:
    "Structural and optical properties of thin lead oxide films produced by reactive DC magnetron sputtering"
    J. Vac. Sci. Technol. A, Vol. 19 , p. 2870 (2001)
    link to Article

  • S. Venkataraj, R. Drese, O. Kappertz, R. Jayavel, M. Wuttig:
    "Characterization of niobium oxide films prepared by reactive DC magnetron sputtering"
    Physica status solidi (a), Vol. 188 , p. 1047 (2001)
    link to Article

  • W. Njoroge, T. Lange, H. Weis, B. Kohnen und M. Wuttig:
    "Defect formation upon reactive DC magnetron sputtering of GeO2 films"
    J. Vac. Sci. and Technol. A, Vol. 18 , p. 42 (2000)
    link to Article

  • T. Lange, W. Njoroge, H. Weis, M. Beckers und M. Wuttig:
    "Physical Properties of thin GeO2 films produced by reactive DC sputtering"
    Thin Solid Films, Vol. 365 , p. 82 (2000)
    link to Article